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晶体折射率的准确测定是晶体上薄膜器件设计的基础。介绍了利用分光光度计测量晶体折射率的方法,通过背面影响系数法、背面镀增透膜和将两者结合起来的方法消除晶体反射率测量时背面反射带来的影响,给出了具体的步骤并对测量误差进行了分析。由于晶体的光学各向异性,采用起偏器扫描的方法测量晶体光学性质随方向的变化。通过对LiB3O5晶体的折射率的测量,证实了该方法的可行性并可用于其他光学晶体折射率的测量。
The accurate measurement of the refractive index of the crystal is the basis of the thin film device design on the crystal. The method of measuring the refractive index of crystal by spectrophotometer is introduced. The influence of the back reflection on the measurement of crystal reflectivity is eliminated by the method of backside influence coefficient, the backside anti-reflection coating and the combination of the two methods. Steps and analysis of measurement error. Due to the optical anisotropy of the crystals, the change of the optical properties of the crystals with the direction was measured by means of a polarizer scan. The measurement of the refractive index of LiB3O5 crystal confirms the feasibility of this method and can be used to measure the refractive index of other optical crystals.