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在室温条件下,采用恒电流电化学沉积技术直接在钨片基体上制备了白钨矿结构的CaWO4晶态薄膜.电化学反应的工艺参数为:电流密度为1mA/cm2、电解液的pH值为13.0、电化学处理时间为1.5h.采用XRD、XPS、SEM技术分析了制备的CaWO4薄膜的晶相、化学组成和表面形貌.所制备的薄膜是表面均匀致密的四方晶系的单相薄膜.
At room temperature, the scheelite CaWO4 thin films were prepared by constant current electrochemical deposition directly on the tungsten substrate.The electrochemical process parameters were as follows: the current density was 1mA / cm2, the pH of the electrolyte Was 13.0 and the electrochemical treatment time was 1.5h.The crystal phase, chemical composition and surface morphology of CaWO4 thin films were analyzed by XRD, XPS and SEM.The prepared thin films were single-phase tetragonal single-phase film.