为了检测列阵式靶面均匀照明光学系统的聚焦特性，成功地开发了测定微米量级光强度起伏干涉斑纹投影放大的新技术。报道了测定聚焦光斑一维、二维大尺度不均匀性及小尺度干涉斑纹的实验方法、结果及误差分析。 In order to detect the focusing characteristics of the uniform illuminating optical system of the array target, a new technique for determining the magnification of the interference spot on the micrometer scale has been successfully developed. The experimental methods, the results and the error analysis of one-dimensional and two-dimensional large-scale non-uniformities and small-scale interference fringes for measuring the focused spot are reported.