论文部分内容阅读
采用红外石英作为基底材料,利用SiO2/ZrO2膜系制备2100nm波段钬激光器0°高反膜。提出一套完整的优化工艺,解决了薄膜的材料(膜料和基底)本身的水吸收,克服了薄膜表面光洁底差、散射吸收损耗大、容易破裂等问题,镀制出的薄膜在激光使用波长透射率小于0.1%,粗糙度小于1nm,并且具有长期稳定性好,可靠性高等特点。
Infrared quartz was used as the substrate material, and a 0 ° high reflection film of a 2100 nm band holmium laser was prepared by using a SiO2 / ZrO2 film system. A complete set of optimization process is proposed to solve the water absorption of the film material (film material and substrate) itself, overcome the problems of smooth film surface roughness, large scattering absorption loss, easy to crack and the like, Wavelength transmittance less than 0.1%, roughness less than 1nm, and has long-term stability, high reliability.