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将频闪成像技术和相移显微干涉技术相结合,提出了一种基于面内补偿的微机电系统(MEMS)离面运动测试方法。首先通过相移显微干涉技术自动采集MEMS结构运动周期内不同准静态位置处的数帧相移干涉图像;然后通过图像处理得到每个准静态位置的亮场图像,进行面内位移测试;最后利用面内位移测试结果对离面位移测试进行补偿,即双相位展开算法,完成对于MEMS结构的离面运动测试。实验结果表明:面内运动的测试的精度可达0.01 pixel,静态离面高度测试的重复精度可达0.52 nm,可以完成伴随着面内位移的MEMS离面位移测试。
Combining stroboscopic imaging technology with phase-shift microscopic interference technology, a MEMS (Inverse Surface Movement) testing method based on in-plane compensation is proposed. Firstly, phase-shift microscopic interference technique was used to automatically acquire several frames of phase-shifted interferograms at different quasi-static positions in the motion period of the MEMS structure. Then the brightfield images of each quasi-static position were obtained by image processing and the in-plane displacement test was performed. Finally The in-plane displacement test is compensated by the in-plane displacement test result, that is, the biphase expansion algorithm is used to complete the out-of-plane motion test of the MEMS structure. The experimental results show that the accuracy of in-plane motion test can reach 0.01 pixel, the repeatability of static out-of-plane height test can reach 0.52 nm, and the MEMS out-of-plane displacement test with in-plane displacement can be completed.