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利用混合离子束系统,通过辉光放电等离子体增强化学气相沉积(PECVD)方法制备出类金刚石薄膜(DLC)和掺氮类金刚石薄膜(N-DLC),用可见拉曼光谱、X射线光电子能谱和扫描探针显微镜表征薄膜微观结构和表面形貌,采用电化学工作站测量了薄膜的电化学性能。结果表明,DLC薄膜的表面光滑致密、粗糙度低,掺氮增加了薄膜中的sp2团簇相并形成了C-N键,并使C-O键含量和薄膜表面的活性位点增加。N-DLC薄膜电极在硫酸溶液中的电化学势窗达4.5 V和较低的背景电流(0.3±0.2μA/cm2);在铁氰化钾溶液中电极的电流响应明显,表现为受扩散控制的准可逆过程。电极具有很好的重复性和稳定性。
Diamond-like carbon (DLC) and nitrogen-doped diamond films (N-DLC) were prepared by glow discharge plasma enhanced chemical vapor deposition (PECVD) using a hybrid ion beam system. The Raman spectrum, X-ray photoelectron energy Spectra and scanning probe microscopy were used to characterize the microstructure and surface morphology of the films. The electrochemical performance of the films was measured by electrochemical workstation. The results show that the surface of DLC film is smooth and dense with low roughness. Nitrogen addition increases the sp2 cluster phase and forms C-N bond in the film, and increases the content of C-O bond and the active sites on the surface of the film. The electrochemical potential window of N-DLC thin film electrode in sulfuric acid solution was 4.5 V and the background current was low (0.3 ± 0.2 μA / cm2). The current response of electrode in potassium ferricyanide solution was obvious, Quasi-reversible process. The electrode has good repeatability and stability.