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大约在两年前,IBM巳制成工业产品用的薄膜磁头。一般来说,其它厂家不久也会研制出同样的产品。而这次却不同。事实上,还没有一个厂家能按照这一技术制造出工业用的薄膜磁头,他们仅制作了实验样品。人们更深入地研究了这一形势之后,认识到按照光刻技术所选择的工艺比想象的要复杂得多。现已研制出另一种多层真空沉积技术。我们将介绍这一技术,并对这两种技术的优点分别进行比较,然后再说未来最有希望的发展趋势。
About two years ago, IBM had made thin-film magnetic heads for industrial products. In general, other manufacturers will soon develop the same product. This time is different. In fact, no single manufacturer has yet developed an industrial thin-film magnetic head in accordance with this technology and they have produced only experimental samples. After a more in-depth study of this situation, one realized that the process chosen by lithography is far more complicated than imagined. Has developed another multi-layer vacuum deposition technology. We will introduce this technology, and compare the merits of these two technologies separately, then say the most promising development trend in the future.