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采用溶胶-凝胶技术分别在K9基片上镀制了光学厚度相近的单层SiO2酸性膜和碱性膜。测试了两类薄膜的激光损伤阈值;分别采用透射式光热透镜技术、椭偏仪、原子力显微镜、扫描电镜和光学显微镜研究了两类薄膜的热吸收、孔隙率、微观表面形貌、激光辐照前薄膜的杂质和缺陷状况以及激光辐照后薄膜的损伤形貌。实验结果表明:相对于碱性膜,酸性膜有更大的热吸收和更小的孔隙率,因此其激光损伤阈值较小;两类薄膜不同的损伤形貌与薄膜的热吸收系数与微观结构有关。
Sol-Gel technology was used to form monolayer SiO2 acid films and alkaline films with similar optical thickness on K9 substrates respectively. The laser damage thresholds of two kinds of films were tested. The heat absorption, porosity, micro-surface morphology and laser radiation of two kinds of films were studied by transmission light-heat lens technique, ellipsometer, atomic force microscope, scanning electron microscope and optical microscope respectively. Impurity and defect of the film before irradiation and damage morphology of the film after laser irradiation. The experimental results show that compared with the alkaline film, the acid film has larger heat absorption and smaller porosity, so the threshold of laser damage is smaller. The different damage morphology and the heat absorption coefficient and the microstructure related.