论文部分内容阅读
为了在所研制的二级透镜聚焦离子束系统中获得直径小于０．２μｍ的稳定束斑，并进行亚微米微细加工，分析了影响束斑大小及稳定性的因素，并着重从像差、散焦和漂移的角度，利用理论分析和模拟计算，研究了决定系统光学性能的离子源、离子引出极、预聚焦极、聚焦极所用高压电源及电对中、消像散透镜、偏转器所用低压电源的稳定度对离子束径的影响，得到了束直径小于０．２μｍ时电源必须达到的稳定度，即高压电源的纹波系数１×１０－４～１×１０－５，低压电源的纹波系数６×１０－４～１×１０－４。
In order to obtain the stable beam spot with the diameter less than 0.2μm in the developed secondary-lens focused ion beam system and perform the submicron micro-machining, the factors that affect the size and stability of the beam spot were analyzed. From the perspective of coke and drift, theoretical analysis and simulation calculations were carried out to study the effects of ion source, ion extraction electrode, prefocusing electrode, high voltage power supply for focusing electrode and electric centering and astigmatism lens, The influence of the stability of the power supply on the ion beam diameter, the stability that the power supply must reach when the beam diameter is less than 0.2 μm, that is the ripple coefficient of the high-voltage power supply is 1 × 10-4 to 1 × 10-5, Wave coefficient of 6 × 10-4 ~ 1 × 10-4.