Preparation of diamond/Cu microchannel heat sink by chemical vapor deposition

来源 :Journal of Central South University | 被引量 : 0次 | 上传用户：arthurzy

【摘要】

：

A Ti interlayer with thickness about 300 nm was sputtered on Cu microchannels, followed by an ultrasonic seeding with nanodiamond powders. Adherent diamond film

【作者】

：

刘学璋罗浩苏栩余志明

【机构】

：

SchoolofMaterialsandMechanicalEngineering,SchoolofMaterialsScienceandEngineering

【出处】

：

Journal of Central South University

【发表日期】

：

2015年3期

【关键词】

：

热丝化学气相沉积金刚石粉末微通道散热器制备场发射扫描电子显微镜铜 FE-SEM chemical vapor deposition microcha

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A Ti interlayer with thickness about 300 nm was sputtered on Cu microchannels, followed by an ultrasonic seeding with nanodiamond powders. Adherent diamond film with crystalline grains close to thermal equilibrium shape was tightly deposited by hot-filame

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Preparation of diamond/Cu microchannel heat sink by chemical vapor deposition

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