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双面抛光运动过程复杂,对光学材料的加工有重要的影响,运动轨迹分布不但影响加工效率,而且影响加工工件的表面质量。通过分析双面抛光加工的运动过程,建立双面抛光中任意一点相对于上抛光盘的运动轨迹的数学模型,改变数学模型中的轨迹运动参数,观察不同参数值对抛光轨迹分布的影响,优化分析得出抛光轨迹分布最佳的运动参数值。研究结果表明,工件在行星轮中的位置远离行星轮的回转中心,行星轮与整个抛光盘半径比为0.3,抛光盘与内齿轮的转速比在3~8倍之间,内外齿轮的转速比在1~4倍的范围内,获得的抛光轨迹最优。
The process of double-sided polishing is complex and has an important influence on the processing of optical materials. The distribution of the trajectories not only affects the processing efficiency, but also affects the surface quality of the processed workpiece. By analyzing the movement process of the double-side polishing, the mathematical model of the trajectory of any point in the double-side polishing with respect to the upper polishing disc is established, the trajectory parameters in the mathematical model are changed, and the influence of different parameters on the distribution of the polishing trajectory is observed and optimized Analyzed the best trajectory distribution of the motion parameter values. The results show that the position of the workpiece in the planetary gear is away from the center of rotation of the planetary gear. The radius ratio of the planetary gear to the entire polishing disk is 0.3, and the rotational speed ratio of the polishing disk and the internal gear is 3-8 times. In the range of 1 ~ 4 times, the optimal polishing path is obtained.