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由北京科华微电子材料有限公司投资建设的我国第一条百吨级高档光刻胶生产线2009年5月8日在北京市顺义区建成并投产运行。这标志着我国开始拥有了自己的高档光刻胶产品,国内微电子技术行业长期依赖进口光刻胶的局面将从此结束。光刻胶是集成电路制造过程中的一种关键材料,它的
Beijing Kehua Microelectronics Materials Co., Ltd. invested by China's first 100-ton high-grade photoresist production line in May 8, 2009 in Shunyi District, Beijing completed and put into operation. This marks the beginning of our country has its own high-grade photoresist products, the domestic micro-electronics industry long-term dependence on the situation of imported photoresist will be over. Photoresists are a key material in the IC manufacturing process