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介绍了1984年至1990年期间干式排气技术所取得的进展情况。干式排气泵研制方面日本处于世界领先地位。在解决了粉尘、腐蚀性蒸气以及泵内残存物的抽除等问题之后,干气排气技术被认为是在半导休工业中最有用的排气技术之一。介绍了在半导体工业中的应用情况,也介绍了在特种排气工艺中的应用。
The progress made in dry-gas exhaust technology between 1984 and 1990 was introduced. Japan’s leading dry-type exhaust pump development in the world. After solving the problems of dust, corrosive vapors and the pumping of residuals in the pump, dry gas exhaust technology is considered as one of the most useful exhaust technologies in the semi-conductor industry. Introduced in the semiconductor industry in the application, but also introduced in the special exhaust technology.