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纳米压印光刻技术已被证实是纳米尺寸大面积结构复制的最有前途的下一代技术之一。这种速度快、成本低的方法成为生物化学、μ级流化学、μ-TAS和通信器件制造以及纳米尺寸范围内广泛应用的一种日渐重要的方法,如生物医学、纳米流体学、纳米光学应用、数据存储等领域。由于标准光刻系统的波长限制、巨大的开发工作量、以及高昂的工艺和设备成本,纳米压印光刻技术可能成为主流IC产业中一种真正富有竞争性方法。对细小到亚10nm范围内的极小复制结构,纳米压印技术没有物理极限。从几种纳米压印光刻技术中选择两种前景广阔的方法——热压印光刻(HEL)和紫外压印光刻(UV-NIL)技术给予介绍。两种技术对各种各样的材料以及全部作图的衬底大批量生产提供了快速印制。重点介绍了HEL和UV-NIL两种技术的结果。全片压印尺寸达200mm直径,图形分辨力高,拓展到纳米尺寸范围。
Nano-imprint lithography has proven to be one of the most promising next-generation technologies for nanosized large-area structural replication. This fast, low-cost approach has become an increasingly important method for biochemistry, μ-flow chemistry, μ-TAS and communications device manufacturing and widespread use in nanoscale applications such as biomedicine, nanofluidics, nanometer optics Applications, data storage and other fields. Due to the wavelength limitations of standard lithography systems, tremendous development effort, and high process and equipment costs, nanoimprint lithography can be a truly competitive approach in the mainstream IC industry. Nanoimprint technology has no physical limit to minutely replicated structures ranging from 10nm to sub-10nm. Two promising methods, hot embossing (UV) and UV-NIL, are selected from several nanoimprint lithography techniques. Both technologies provide rapid printing of a wide variety of materials as well as mass production of fully patterned substrates. Focus on the HEL and UV-NIL two techniques results. The entire film embossed size of 200mm diameter, high resolution graphics, extended to the nano-size range.