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采用微波等离子体化学气相沉积（ MPCVD）法在附有 SiO2掩摸的硅衬底上选择性沉积出 了金刚石膜。采用扫描电子显微镜（ SEM）和 Raman光谱仪对金刚石膜的表面形貌和结构进行 了表征 ,并讨论了衬底温度对金刚石薄膜选择性沉积的影响，得出了较佳的沉积条件。
Diamond film was selectively deposited on silicon substrate with SiO2 mask by microwave plasma chemical vapor deposition (MPCVD). The surface morphology and structure of diamond films were characterized by scanning electron microscopy (SEM) and Raman spectroscopy. The effects of substrate temperature on the selective deposition of diamond films were discussed. The better deposition conditions were obtained.