采用多弧离子镀技术在40Cr基体上制备TiAlN/TiN复合膜层,通过金相显微镜、扫描电镜和显微硬度仪研究靶电流对膜层表面形貌、沉积率及硬度的影响。结果表明:靶材电流对膜层组织和硬度有显著影响,电流越高膜层表面越不平整,显微硬度随靶材电流的升高先上升后降低。靶电流越高,膜层中Ti、Al原子的含量就越高。 TiAlN / TiN composite films were prepared on 40Cr substrate by multi-arc ion plating technique. The effects of target current on the surface morphology, deposition rate and hardness of the films were investigated by optical microscope, scanning electron microscopy and microhardness tester. The results show that the current of the target has a significant effect on the microstructure and hardness of the coating. The higher the current, the more uneven the surface of the coating. The microhardness firstly increases and then decreases with the increase of the target current. The higher the target current, the higher the content of Ti and Al atoms in the film.