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介绍了线宽小于10nm 的多晶硅缝隙纳米线的制作技术。缝纳线技术适用于制作量子器件、光电器件和集成电路。
The production technology of polysilicon gap nanowires with line width less than 10nm is introduced. Nanowire technology for the production of quantum devices, optoelectronic devices and integrated circuits.