在光刻设备中,掩模的定位误差会直接影响光刻精度,单掩模装置手动调换式是如此,多掩模自动调换也是如此。为了提高掩模寿命,保证精度并实现自动化,运用多掩模装置,轴系允差0.2μm,只要求相对定位精度。轴系的结构精度,是解决问题的关键。经分析研究,实践证明所用的结构简单正确。 In lithographic equipment, the positioning error of the mask has a direct impact on the lithography accuracy, as is the manual exchange of single mask devices, and the automatic transfer of multiple masks. In order to improve the mask life, to ensure accuracy and automation, the use of multi-mask device, shaft tolerance 0.2μm, requiring only relative positioning accuracy. Shaft structure accuracy is the key to solving the problem. After analysis and research, the practice proved that the structure used is simple and correct.