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为探索微通道板的噪声来源，利用X射线光电子能谱对国内和国外MCP电极表面进行组分分析。实验发现，在国外MCP电极表面上只检测到Ni，Cr，C，O等原子谱峰，而在国内的MCP电极表面还检测到K，Na，Si等原子谱峰，且在国产未镀电极的MCP表面检测出K的原子谱峰。分析认为，MCP体内的K有向表面偏析的现象；MCP电极表面上的杂质，如K，Na，Si等是MCP噪声来源之一；国产MCP表面的杂质不仅与MCP镀膜材料纯度、系统真空度有关，而且还与电极膜层的致密性有关。
In order to explore the noise source of microchannel plate, the composition of MCP electrode surface at home and abroad was analyzed by X-ray photoelectron spectroscopy. It was found that only the atomic peaks of Ni, Cr, C, O and so on were detected on the surfaces of MCP electrodes abroad, while the atomic peaks of K, Na and Si were also detected on the surface of MCP electrodes in China. Of the MCP surface detected K atomic peak. It is concluded that there is segregation of K-directed surface in the MCP body; impurities on the surface of the MCP electrode, such as K, Na and Si, are one of the sources of MCP noise. Impurities in the domestic MCP surface are not only related to the purity of the MCP plating material, Related, but also with the electrode film density.