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随着器件特征尺寸的不断减小,传统光刻技术的加工分辨率受限于衍射极限已接近使用化技术的理论极限且成本过高。无掩模光刻技术是解决掩模价格不断攀升而引起成本过高的一种潜在方案,以成本低、灵活性高、制作周期短的特点在微纳加工、掩模直写、小批量集成电路的制作等方面有着广泛的应用。基于空间光调制器的无掩模光学光刻技术在提高分辨率和产出率方面取得了一定的进展,理论和实验上均取得了较好的效果。详细归纳介绍了基于空间光调制器的无掩模光学光刻技术的原理、特点以及研究进展。
As device feature sizes continue to decrease, the processing resolution of conventional lithography is limited by the fact that the diffraction limit approaches the theoretical limit of using technology and that the cost is too high. Maskless lithography is a potential solution to the rising cost of masks that can cause high costs. With its low cost, high flexibility and short production cycle, the maskless lithography technology is widely used in micro / nano processing, mask direct writing and small batch integration Circuit manufacturing has a wide range of applications. The maskless optical lithography based on spatial light modulator has made certain progress in improving the resolution and output rate, and has achieved good results both in theory and experiment. The principle, characteristics and research progress of maskless optical lithography based on spatial light modulator are introduced in detail.