本文运用射频辉光放电的低温等离子体在基底上沉积出均匀、透明的聚六甲基二硅气烷（HMDSO）聚合膜，用红外光谱揭示了材料的化学结构。通过击穿和伏安特性研究了等离子体聚合膜的强场特性，发现其导电机理为场助热离子跃迁。此外还分析了退火工艺对薄膜结构和击穿性能的影响。 In this paper, a uniform, transparent poly (hexamethyldisilazane) (HMDSO) polymer film was deposited on the substrate by low frequency plasma with radio frequency glow discharge. The chemical structure of the material was revealed by infrared spectroscopy. The strong field characteristics of plasma polymerized films were investigated by breakdown and volt-ampere characteristics. The conduction mechanism was found to be field-assisted thermal ion transition. In addition, the influence of annealing process on the structure and breakdown performance of the film was also analyzed.