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本文介绍了为新型电子束曝光机研制的高精度30kV高压稳压电源。该电源采用双闭环调整,集中补偿和分散补偿相结合的设计方案。对电源的关键性技术采取了有力措施,使各项技术指标均达到设计要求。
This article describes the high-precision 30kV high voltage regulated power supply developed for the new electron beam exposure machine. The power supply with dual closed-loop adjustment, centralized compensation and dispersion compensation combined design. The power of the key technologies to take effective measures to make the technical indicators have reached the design requirements.