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提供了一种由络合剂、稳定剂、添加剂组成的Cr(Ⅲ )水溶液电镀镜面非晶态铬新方法。采用Hull槽实验、动电位扫描 (LSV)、计时电流 (CA)、计时电位 (CE)等电化学方法对Cr(Ⅲ )水溶液中电沉积非晶态铬的电化学机理进行了研究。实验结果表明在 - 0 .96～ - 1 .1V之间生成的蓝膜是光亮非晶态Cr层得以电沉积出来的首要条件。讨论了Cr2 +离子和Cr(Ⅲ )配合离子在电沉积非晶态铬镀层中的作用以及镜面非晶态铬镀层的形成机理。并用X射线衍射和扫描电子显微镜 (SEM )等方法对铬镀层的结构进行了检测分析。
A new method of electroplating mirror-grade amorphous chromium with Cr (Ⅲ) aqueous solution composed of complexing agent, stabilizer and additive is provided. The electrochemical mechanism of electrodeposition of amorphous chromium in Cr (Ⅲ) aqueous solution was studied by electrochemical methods such as Hull cell experiment, LSV, CE and CE. The experimental results show that the blue film formed between -0.96 and -1.1 V is the first condition for the bright amorphous Cr layer to be electrodeposited. The effects of Cr2 + ions and Cr (Ⅲ) complex ions on the electrodeposition of amorphous chromium coatings and the formation mechanism of mirror-like amorphous chromium coatings were discussed. The structure of chrome plating was analyzed by X-ray diffraction and scanning electron microscopy (SEM).