论文部分内容阅读
《亚太电子商情》2003年10月报道:由Semiconductor Research公司(SRC)及美国国防先进研究项目局组织的Low Volume Patterning Workshop预计将讨论基于微反射镜阵列的非掩膜光刻方法所存在的技术挑战。工作组旨在基于一个可编程或可重配置的掩膜,从5000万～1亿个微反射镜阵列生成一个扫描器,每一个反射镜测量不到10个微米。这些反射镜能把10KHz速度的光脉
Asia Pacific eNewsletter October 2003 Reported: The Low Volume Patterning Workshop, organized by Semiconductor Research Corporation (SRC) and the Defense Advanced Research Projects Agency, is expected to discuss techniques based on micro-mirror array-based non-mask lithography methods challenge. The team aims to generate a scanner from 50 million to 100 million micro-mirror arrays based on a programmable or reconfigurable mask, with each mirror measuring less than 10 microns. These mirrors can bring light at 10KHz speed