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本文介绍了参加SEMICON/WEST′91展览会所见到的国外光刻设备——新研制的制造亚微米器件(16Mb)用的半导体设备已面市。特别引人注目的是许多公司已推出它们的新型光刻设备——0.5～0.8μm硅片分布重复光刻机,如ASM公司的PAS-5500型,Ultratech公司的Ultrastep-2000型,GCA公司的XLS-7000系列,Canon公司的FPA-2000il型,Nikon公司的NSR2005G8i/i8A型依靠i线光刻的分步重复光刻机及用于生产64Mb及256Mb DRAM的有效使用准分子激光器深紫外光刻机的市场可望连续增长。
This article describes the foreign lithography equipment seen at SEMICON / WEST’91 - the newly developed semiconductors for submicron devices (16Mb) are available. Of particular interest are the many companies that have introduced their new lithography equipment - a 0.5 ~ 0.8μm wafer distribution repetitive lithography machine such as ASM’s PAS-5500, Ultratech’s Ultrastep-2000, GCA’s XLS-7000 series, Canon FPA-2000il, Nikon NSR2005G8i / i8A i-line lithography step by step repeat lithography and for the production of 64Mb and 256Mb DRAM effective use of excimer laser deep ultraviolet lithography Machine market is expected to continue to grow.