Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microele

来源 :矿物质和材料特性和工程(英文) | 被引量 : 0次 | 上传用户：jie_er

【摘要】

：

Aluminum Nitride films were grown on and Si (100) substrate by D.C. reactive magnetron sputtering at room temperature. Influence of sputter deposition time on p

【作者】

：

V. VasanthiPillay K. Vijayalak

【机构】

：

DepartmentofPhysics,DepartmentofPhysics

【出处】

：

矿物质和材料特性和工程(英文)

【发表日期】

：

2012年7期

【关键词】

：

Aluminum NITRIDE THIN Films SPUTTERING Preferential ORIENTATIONS Aluminum Nitrid

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Aluminum Nitride films were grown on and Si (100) substrate by D.C. reactive magnetron sputtering at room temperature. Influence of sputter deposition time on properties of the AlN films was studied. Structural optical and electrical properties of the fil

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Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microele

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