电子工业作单晶片用的硅必须超净超纯。这里介绍一种生产超纯材料的方法,高度可控、有效、价廉并可连续生产。用的是一般的连续CO_2激光器(10.6微米)。激光束入射角大约是88°,这是反射率最小的一个角度。对于光能量与液态硅取得最大配合,这个角度是关键。在法向入射下液态硅的光学特性是不合适的。 Silicon for the single-chip electronics industry must be ultra-pure and ultra-pure. Here is a method of producing ultra-pure materials, highly controlled, effective, inexpensive and continuous production. A typical continuous CO 2 laser (10.6 μm) was used. The angle of incidence of the laser beam is about 88 °, which is the smallest angle of reflection. For light energy and liquid silicon to achieve maximum cooperation, this point is the key. The optical properties of liquid silicon at normal incidence are not suitable.