【摘 要】
：
Benzoylfonnamide(BFA) derivatives are proposed as new photocagcd bases with good solubility in epoxy resin.Initially their structures were confirmed by ~1H NMR,
【机 构】
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State Key Laboratory of Pulp & Paper Engineering,South China University of Technology,Institute of P
【出 处】
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Chinese Chemical Letters
论文部分内容阅读
Benzoylfonnamide(BFA) derivatives are proposed as new photocagcd bases with good solubility in epoxy resin.Initially their structures were confirmed by ~1H NMR,~(13)C NMR,and elemental analysis.Next,we detail their thermal stability,solubility behavior,and photolysis products.Furthermore,the model photo-latent anion polymerization(AP) of epoxide system in the presence of BFA-dBA(N,N-dibenzyl-2-oxo-2-phenylacetamide) as a photocaged base has been investigated,and excellent photopolymerization profile is obtained.
Benzoylfonnamide (BFA) derivatives are proposed as new photocatcd bases with good solubility in epoxy resin. Initially their structures were confirmed by ~ 1H NMR, ~ (13) C NMR, and elemental analysis. and photolysis products. Fluorrthermore, the model photo-latent anion polymerization (AP) of epoxide system in the presence of BFA-dBA (N, N-dibenzyl-2-oxo-2-phenylacetamide) as a photocaged base has been investigated, and excellent photopolymerization profile is obtained.
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