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本文应用流体力学原理,讨论了LPCVD膜均匀性与流速分布的关系.指出反应剂浓度在硅径向分布不均匀是造成淀积膜不均匀的主要原因.依据雷诺数关系式,在石英管径、反应流速不变的LPCVD系统中,增大绕体直径可增大雷诺数,变层流为湍流.我们用大于硅片的薄石英图片做载片的挡板,设计制作了LPCVD“挡板式石英舟”,获得的LPCVD SiH_4-NH_3体系Si_3N_4膜不均匀性单片<±1%,最佳<±0.5%,片间<±1.5%,最佳<±0.3%的先进水平,文章具体介绍了挡板舟的设计参数和制作注意事项.
In this paper, the relationship between the uniformity of LPCVD film and the flow velocity distribution is discussed in this paper. It is pointed out that the uneven distribution of reactant concentration in the silicon radial distribution is the main reason for the nonuniformity of deposited film. Based on the Reynolds number relationship, , LPCVD system with constant flow rate can increase Reynolds number and turn laminar flow into turbulent flow by increasing the diameter of the wound body.We designed the LPCVD baffle Type quartz boat ", the obtained LPCVD SiH_4-NH_3 system Si_3N_4 film inhomogeneity monolithic <± 1%, the best <± 0.5%, the inter-sheet <± 1.5%, the best <± 0.3% advanced level, the article specific The baffle boat design parameters and production precautions are introduced.