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本文报道了用于半导体光刻的一体化小型KrF准分子激光器及光学系统的性能。获得了16mm×40mm的均匀光斑，光强分布不均匀性＜±5％光密度～1mJ／cm2。最后讨论了改善微区均匀性的方法。
This paper reports the performance of an integrated small KrF excimer laser and optical system for semiconductor lithography. A uniform spot of 16 mm × 40 mm was obtained with an uneven light intensity distribution of ± 5% optical density ~ 1 mJ / cm 2. Finally, we discuss how to improve the uniformity of micro-regions.