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研究了新型渗硼剂Ｂ（ＣＨ３Ｏ）３的分解离化行为及渗硼工艺。结果表明：在室温条件下Ｂ（ＣＨ３Ｏ）３主要分解离化为Ｂ（ＣＨ３Ｏ）Ｈ＋、Ｂ（ＣＨ３Ｏ）ＯＨ＋和Ｂ（ＣＨ３Ｏ）２＋；在设计的工艺条件下可以得到均匀致密的渗硼层
The decomposition and ionization behavior of the new boronizing agent B (CH3O) 3 and the boronizing process were studied. The results show that B (CH3O) 3 decomposes to B (CH3O) H +, B (CH3O) OH + and B (CH3O) 2+ mainly at room temperature. A uniform and dense boronizing layer can be obtained under the designed process conditions