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以 Be为基体 ,采用磁控溅射离子镀在其上镀制 Al膜 ,研究了负偏压对 Al膜微结构的影响 ;研究表明 ,不加基体负偏压 ,Al膜在 (111)面择优生长 ;随着基体负偏压升高 Al膜在 (111)面择优生长趋势减弱 ,Al膜在 (2 0 0 )面生长趋势加强 ;当基体负偏压超过 15 0 V后 ,Al膜在 (111)面择优生长的趋势又得到加强。晶粒在低负偏压时随负偏压增加而细化 ,当较高的负偏压引起基体温度升高时 ,此时晶粒又变大了。
The effect of negative bias on the microstructure of Al film was investigated by magnetron sputter ion plating and Al coating on Be substrate. The results show that without the substrate negative bias, The growth of Al film on the (200) surface strengthened with the increase of substrate negative bias voltage. The growth of Al film on the (111) (111) surface preferred growth trend has been strengthened. The grains are refined with the increase of the negative bias voltage when the bias voltage is low, and the grain size becomes larger when the substrate temperature is increased due to the higher negative bias voltage.