真空蒸发制备每cm~2几到十几μg厚的薄膜层很难控制,为此在真空蒸发装置上增设石英微量天平控厚。我们用背散射技术测定了用上述方法制备的Al衬底蒸镀Au,Tm和Pd等膜层的质量厚度。结果表明,石英微量天平对薄膜厚度的监控是有效的。 Preparation of vacuum evaporation per cm ~ 2 to a dozen or more micrograms of thick film layer is difficult to control, for this purpose in the vacuum evaporation device added quartz microbalance control thick. We measured the mass thicknesses of the Au, Tm and Pd films deposited on the Al substrate prepared by the above method using backscattering technique. The results show that quartz microbalance monitoring the thickness of the film is effective.