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在真空条件下利用真空电弧源在不同基底材料上镀制了TiO2薄膜。对影响镀膜过程和膜层质量的氧气工作压强和偏压等因素进行了研究。X射线衍射结构分析结果显示TiO2薄膜主要以锐钛矿相为主及少量的金红石相。对TiO2薄膜的物理性质、化学性质进行了初步检测。
TiO2 films were deposited on different substrates by vacuum arc source under vacuum condition. The influencing factors of oxygen pressure and bias of coating process and film quality were studied. X-ray diffraction structure analysis results show that the TiO2 film mainly anatase phase and a small amount of rutile phase. The physical and chemical properties of TiO2 thin film were preliminarily tested.