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研究铝合金上电弧离子镀(Ti,Al)N膜层的腐蚀性能。通过对3种N2气分压下沉积膜层的阳极极化曲线、电化学阻抗谱、盐雾腐蚀失重曲线以及表面形貌的分析表明:沉积过程氮分压较低时,膜层中含有富金属相,耐腐蚀性能较低;增加氮分压使膜层中金属与非金属呈理想配比时,膜层的耐腐蚀性明显增加;膜层在缺陷处产生点蚀、电偶腐蚀,并通过形成裂纹、碎屑脱落使质量显著减小。
The corrosion behavior of (Ti, Al) N coating on aluminum alloy was studied. Anodic polarization curve, electrochemical impedance spectroscopy, salt spray corrosion weight loss curve and surface morphology of the deposited films under three partial pressure of N2 gas show that when the nitrogen partial pressure is low, the film contains rich Metal phase, low corrosion resistance; increased nitrogen partial pressure so that the film layer of metal and non-metallic was stoichiometric ratio, the film corrosion resistance increased significantly; film pitting in the defect, galvanic corrosion, and Through the formation of cracks, the quality of the scraps is significantly reduced.