A nano-structured surface is formed on the pyramid structure of n-type silicon solar cells by size-controlled silver nano-particle assisted etching.Such a nano-structure creates a front average weighted reflectance of less than 2.5％ in the 300-1200nm range due to the broadband reflection suppression.The sodium hydroxide is used to obtain the low-area surface by post-etching the nano-structure,thus the severe carrier recombination associated with the nano-structured surface could be reduced.After emitter forming,screen printing and firing by means of the industrial fabrication protocol,an 18.3％-efficient nano-structured silicon solar cell with rear emitter is fabricated.The process of fabricating the solar cells matches well with industrial manufacture and shows promising prospects.