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采用高功率复合脉冲磁控溅射的方法(HPPMS)在不锈钢基体上制备ZrN薄膜,对比DCMS方法制备的ZrN薄膜,得出HPPMS制备的薄膜表面更平整光滑、致密,既无空洞、又无大颗粒等缺陷。Ar/N对薄膜相结构及硬度、耐磨耐蚀等有较大影响。XRD结果显示,薄膜主要以ZrN(111)和ZrN(220)晶面择优生长,并呈现出多晶面竞相生长的现象。制备的ZrN薄膜的硬度最高可达33.1 GPa,同时摩擦系数小于0.2,耐腐蚀性也有很大提高,腐蚀电位比基体提高了0.27 V,腐蚀电流下降到未处理工件的1/5。存在一个合适的Ar/N比,使得制备的ZrN薄膜具有较好的耐磨性和耐腐蚀性。
The ZrN thin films were prepared on a stainless steel substrate by HPPMS and compared with the ZrN thin films prepared by DCMS. The results showed that the surface of HPPMS thin films was smooth and dense, with neither voids nor large Particles and other defects. Ar / N film structure and hardness, wear and corrosion have a greater impact. The results of XRD show that the films grow predominately by the ZrN (111) and ZrN (220) planes and exhibit the phenomenon of multiphase race growth. The hardness of the prepared ZrN film is up to 33.1 GPa, the friction coefficient is less than 0.2, the corrosion resistance is greatly improved, the corrosion potential is 0.27 V higher than that of the substrate, and the corrosion current is reduced to 1/5 of the untreated workpiece. There is a suitable Ar / N ratio, making the prepared ZrN film has good wear resistance and corrosion resistance.