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近年来,纳米科学技术研究得到了广泛的重视.随着越来越多纳米材料的发现,人们需要能用在纳米尺度的新技术来了解材料的特殊性质.本文,我们介绍了一种测量介观样品热电效应的方法.通过标准光刻过程,我们制作了由一个微型加热器和两个温度计组成的介观结构.这个结构可以建立一个温场,并能测量出样品两端的温差.通过采用2ω方法,我们可以准确地测量出几个mK的温差和相应的热电响应.本文采用此方法测量了300K到10K温度范围内拓扑绝缘体的热电效应.
In recent years, nanoscience and technology research has received widespread attention.With the discovery of more and more nanomaterials, people need to be able to understand the special properties of materials using new techniques at the nanoscale.In this paper, we introduce a measurement medium Method of Observing the Thermoelectric Effect of a Sample Through a standard lithography process, we fabricated a mesoscopic structure consisting of a miniature heater and two thermometers, which creates a temperature field and measures the temperature difference across the sample. 2ω method, we can accurately measure the temperature difference of several mK and the corresponding thermoelectric response.This method is used to measure the thermoelectric effect of topological insulators in the temperature range of 300K to 10K.