量子编织（quantumentanglement）是一种没有 先例可以比拟的新现象。这 种现象所隐含的原则,如果 进一步得到实验证实,将可 能对半导体制造技术产生重 大影响。根据此原理拟定的 方案,将依靠拟制的文件光 刻腐蚀制成任问2维象素图 案,而不再需要使用掩膜版。 马里兰大学（位于马里 兰州的Baltimore）的研究人 员成功地作出双狭缝衍射图 案,衍射的波长只有使用同 样的光束按照传统方法所产 生衍射图案波长的一半。他 们是使用自发参数下变换器 SPDC（spontaneousparametric downconversion）所产生的光子 Quantumentanglement is a new phenomenon that can be compared without precedent. The underlying principles of this phenomenon, if further experimentally confirmed, could have a significant impact on semiconductor manufacturing technology. The proposed scheme based on this principle will rely on the proposed document lithography etching made of any two-dimensional pixel pattern, and no longer need to use the mask version. Researchers at the University of Maryland in Baltimore, Maryland, have succeeded in creating a double slit diffraction pattern that uses only half the wavelength of the diffraction pattern produced by the conventional method using the same light beam. They are photons generated using spontaneous parametric downconversion (SPDC)