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采用微波等离子体化学气相沉积(MPCVD)方法在铜衬底上沉积了微米和纳米两种金刚石薄膜,过渡层均为钛-铝-钼。用场发射扫描电子显微镜(FESEM)观察薄膜的表面及断面形貌,用拉曼(Raman)光谱测量所得金刚石薄膜的质量,利用压痕法测试了所得薄膜的附着性能,研究结果表明:过渡层可有效提高微米金刚石薄膜在铜衬底上的附着力,反应气氛中Ar的存在可促使纳米金刚石薄膜的形成,改善薄膜表面的粗糙度。
Two types of diamond films were deposited on the copper substrate by microwave plasma chemical vapor deposition (MPCVD). The transitional layers were all Ti-Al-Mo. The surface and cross-sectional morphology of the film were observed by field emission scanning electron microscopy (FESEM). The quality of the obtained diamond film was measured by Raman spectroscopy. The adhesion properties of the obtained film were measured by indentation method. The results show that the transition layer Effectively improve the adhesion of the micro-diamond film on the copper substrate, the presence of Ar in the reaction atmosphere can promote the formation of the nano-diamond film and improve the surface roughness of the film.