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以AAO/Si为模板,采用化学气相沉积(CVD)的方法在不同温度下,通过煅烧Zn粉和C粉的混合物制备ZnO/AAO/Si组装体系,并对其结构和性质进行了研究。扫描电镜(SEM)结果表明:随着煅烧温度的升高,AAO表面的孔洞逐渐被封堵,当温度达到900℃时,在AAO的表面出现了一层ZnO薄膜。X射线衍射(XRD)结果显示,700℃时在XRD图谱上观看到六角纤锌矿的ZnO的衍射峰,并且随着温度的升高,ZnO的衍射峰逐渐增强,当温度升至800和900℃时出现了ZnAl2O4的衍射峰。因此,化学气相沉积制备组装体系时的最适温为700℃。在700℃时煅烧不同恒温时间制备的ZnO/AAO/Si组装体系SEM图显示,随着恒温时间的延长,孔的封闭效应逐渐明显。
The structure and properties of ZnO / AAO / Si composites were prepared by calcining a mixture of Zn powder and C powder by chemical vapor deposition (CVD) at different temperatures using AAO / Si as a template. Scanning electron microscopy (SEM) results show that the pore of AAO surface is gradually blocked with the increase of calcination temperature. When the temperature reaches 900 ℃, a ZnO thin film appears on the surface of AAO. The results of X-ray diffraction (XRD) showed that the diffraction peaks of ZnO with hexagonal wurtzite were observed on XRD patterns at 700 ℃, and the diffraction peaks of ZnO increased with the increase of temperature. When the temperature increased to 800 and 900 ℃ ZnAl2O4 diffraction peaks appeared. Therefore, the optimal temperature for preparing the assembly system by chemical vapor deposition is 700 ° C. The SEM images of the ZnO / AAO / Si assembly prepared by calcination at 700 ℃ for different isothermal time show that the pore blocking effect becomes obvious with the extension of the isothermal time.