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采用AFM、XRD和EDS等手段,对TiNi合金在空气中、400—800℃下形成的氧化膜组织结构进行了分析,并对TiNi合金表面原位热氧化膜的光电性能进行了研究.结果表明,TiNi合金在空气中氧化原位形成的氧化膜的结构主要为金红石型二氧化钛,不同温度下生长的氧化膜存在择优取向;随着氧化温度的升高,所制备的TiO2/TiNi电极的稳态光电流和开路光电压随氧化温度的升高先增大后减小,在700℃所制备的TiO2/TiNi电极的稳态光电流最大.
The structure of oxide film formed on TiNi alloy in air at 400-800 ℃ was analyzed by means of AFM, XRD and EDS, and the photoelectric properties of in-situ thermal oxide film on TiNi alloy surface were studied. The structure of the oxide films formed by in-situ oxidation of TiNi alloy in the air is mainly rutile titanium dioxide. The preferred orientation of the oxide films grown at different temperatures exists. With the increase of the oxidation temperature, the steady state of the prepared TiO2 / TiNi electrodes The photocurrent and open circuit voltage first increased and then decreased with the increase of the oxidation temperature, and the steady-state photocurrent of TiO2 / TiNi electrode prepared at 700 ℃ was the highest.