研究了溅射参数对 Ge2 Sb2 Te5 薄膜的光学常数随波长变化关系的影响 ,结果表明 :(1)当溅射功率一定时 ,随溅射氩气气压的增加 Ge2 Sb2 Te5 薄膜的折射率先增大后减小 ,而消光系数先减小后增大 .(2 )当溅射氩气气压一定时 ,对于非晶态薄膜样品 ,在 5 0 0 nm波长以下 ,折射率随溅射功率的增加先增加后减小 ,消光系数则逐渐减小 ;在 5 0 0 nm以上 ,折射率随溅射功率的增加逐渐减少 ,消光系数先减小后增加 .对于晶态薄膜样品 ,在整个波长范围折射率随溅射功率的增加先减小后增加 ,消光系数则逐渐减少 .(3)薄膜样品的光学常数都随波长的变化而变化 ,在长波长范围变化较大 ,短波长范围变化较小 .探讨了影响 Ge2 Sb2 Te5 薄膜光学常数的机理 The influence of sputtering parameters on the optical constants of Ge2Sb2Te5 thin films was studied. The results show that: (1) the refractive index of Ge2Sb2Te5 films increases with the increase of sputtering argon gas pressure at a certain sputtering power (2) When the sputtering argon gas pressure is constant, for the amorphous film samples, under the wavelength of 500 nm, the refractive index increases with the increase of the sputtering power And the extinction coefficient decreases gradually. When the temperature is above 500 nm, the refractive index decreases with the increase of sputtering power and the extinction coefficient decreases first and then increases. For the crystalline thin film samples, the refractive index (3) The optical constants of the thin films vary with the wavelength, and change greatly in the long wavelength range and less in the short wavelength range, as the sputtering power increases. The mechanism affecting the optical constants of Ge2 Sb2 Te5 thin films