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介绍了在中国华晶中央研究所１．０微米工艺线上所开发的亚微米（０．８μｍ）工艺流程，重点介绍了０．８μｍ器件结构、工艺流程图、关键工艺设计以及用此流程制造出的０．８μｍ器件的各项ＰＣＭ参数。
The submicron (0.8μm) process flow developed on the 1.0μm process line of Huajing Central Research Institute of China is introduced. The structure of the 0.8μm device, the process flow chart, the key process design and the manufacturing process 0.8μm devices out of the PCM parameters.