We fabricate organic thin films using the copolymer of methyl methacrylate and glycidyl methacrylate (PMMA-GMA) as a gate dielectric with a simple top-contact structure. Copper phthalocyanine (CuPc) TFTs are fabricated and the influences of annealing on the performance are studied. The mobilities increase from 2.5 ×103 cm2/Vs to 4.2 × 103 cm2/Vs and threshold voltages decrease from -18 V to -10 V after annealing. The good performances of the devices approach those obtained with inorganic gate dielectric materials such as silicon dioxide under the same technical conditions. It is fully proven that PMMA-GMA is a competitive candidate as an excellent gate insulation layer.