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为提高平面光学元件的加工质量和效率,理解元件与抛光盘之间的相对运动轨迹变化规律是获得良好表面质量的重要前提。根据“运动学原理”和“坐标变换”建立了磨粒运动轨迹模型,推导了磨粒轨迹长度公式。利用Matlab软件模拟计算了各参数下的磨粒轨迹长度和磨粒轨迹变化形态。研究表明:不同转速比对材料去除速率和表面质量影响显著;随着磨粒径向距离和偏心距的增大,磨粒轨迹长度增加,考虑到偏心距对工件表面质量的影响,偏心距不宜太大或太小;同一转速比下,不同的磨粒初始角度对磨粒轨迹形状没有影响,只会使其转过相应角度。
In order to improve the processing quality and efficiency of planar optical components, it is an important precondition to obtain good surface quality to understand the variation of relative motion between the component and the polishing disc. According to “kinematic principle” and “coordinate transformation”, a model of abrasive particle trajectory is established, and the formula of abrasive particle trajectory length is deduced. Using Matlab software to simulate the parameters of the abrasive trajectory length and abrasive trajectory change morphology. The results show that different speed ratios have a significant effect on material removal rate and surface quality. With the increase of radial distance and eccentricity, the length of abrasive path increases. Considering the influence of eccentricity on the surface quality of workpiece, eccentricity should not be suitable Too large or too small; the same speed ratio, the initial angle of different abrasive particle trajectory shape has no effect, only make it turn the corresponding angle.