The principle of spontaneous monolayer dis-persion holds that active components of many supported catalysts will disperse spontaneously onto the surface of the carrier. The monolayer dispersion threshold of the active component on the surface of the carrier can be measured by X-ray diffraction phase-quantitative extra-polation method, etc. By measuring the monolayer disper-sion threshold, beneficial information on the surface structure and dispersion of supported catalysts can be obtained, and the optimal preparative processing condi-tions of the catalysts can be chosen. The proportion of the active component of many supported catalysts can be optimized while its monolayer dispersion threshold is observed. Mutation values of many physicochemical properties of supported catalysts are related to monolayer dispersion thresholds; the threshold effect on catalysts is apparent, and the proposal regarding the threshold effect provides instruction for the research on catalysts.