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本文提出一种全面描述光刻机离轴照明光源物理分布特性的全参数解析模型,该模型采用Sigmoid函数作为构造各种主流离轴光源解析模型的核函数.提出通过加入光源全参数修正项来表征真实光源的各种物理畸变和偏差,全参数修正项可展开为傅里叶级数形式,相应级次的傅里叶系数具有特殊的物理意义,可分别代表偏心、倾斜、椭偏等形式的光源畸变,为光刻分辨率增强技术及其相关领域提供了仿真条件与理论依据,具有重要的应用价值.
In this paper, a full-parameter analytical model for fully describing the physical distribution characteristics of a lithography off-axis illumination light source is proposed, which uses the Sigmoid function as a kernel function for constructing analytical models of various mainstream off-axis light sources. Characterize all kinds of physical aberrations and deviations of real light source, the full parameter correction term can be expanded into Fourier series form, the corresponding level of Fourier coefficient has special physical meaning, which can represent eccentricity, tilt, ellipsometry and other forms Of the light source distortion for the lithography resolution enhancement technology and related fields to provide the simulation conditions and theoretical basis, has important application value.