描述了CCD光刻过程中出现的常见缺陷及其分类。对光刻过程中缺陷产生的原因进行了分析,找出工艺设置和工艺操作过程中容易出现的问题;并针对各类缺陷,提出了相应的解决措施,以达到消除缺陷的目的,使工艺能力得到提升。 Describes common defects and their classification in CCD lithography. The causes of the defects in the lithography process are analyzed to find out the problems that are easy to occur during the process setting and the process operation. Corresponding solutions to various defects are put forward so as to achieve the purpose of eliminating the defects, Be promoted.