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2011年7月27日Enthone发布的新闻公告中关于安美特的许可协议含有误导的信息。该新闻公告声称,Enthone已授予安美特沉锡工艺的专利许可权。安美特在此向客户提供一个完整和准确的事实,以反映整个事情真实的一面。背景:此协议源自于安美特在中国法庭对Enthone的铜锡合金层(IMC)抗锡须无机添加剂在中国专利权提出的抗议。安美特认为,Enthone的抗锡须无机添加剂不应在中国取得专利权,因为在此方法之前已有文献记载。法庭初
July 27, 2011 Enthone's press release contains about misleading information about Atotech's license agreement. The press release claims that Enthone has granted patent rights to Atotech's tin-sink process. Atotech here to provide customers a complete and accurate facts to reflect the true side of the whole thing. Background: This agreement stems from Atotech's protests in China against the patenting of Enthone's tin-tin-based inorganic additives for the copper-tin alloy layer (IMC) in China. Atotech believes Enthone's tin-resistant inorganic additives should not be patented in China because it has been previously documented in this method. Court early